X. ZHOU; Q. Y. FENG. Comparison of Different Ways of Extra Phosphorus Implantation Which Decrease the Threshold Voltage and On-resistance of UMOS. The Applied Computational Electromagnetics Society Journal (ACES), [S. l.], v. 35, n. 11, p. 1398–1399, 2020. Disponível em: https://journals.riverpublishers.com/index.php/ACES/article/view/7601. Acesso em: 25 apr. 2024.