Associate Editors:

• Max Bakaev, Novosibirsk State Technical University, Russia
• Mária Bieliková, Slovak University of Technology, Slovakia
• Jamie Blustein, Dalhousie University, Canada
• Benatallah Boualem, UNSW Sydney, Australia
• Alessandro Bozzon, Delft University of Technology, The Netherlands
• Marco Brambilla, Politecnico di Milano, Italy
• Jose Gonzalez Enriquez, University of Sevilla, Spain
• Maria Jose Escalona, Universidad de Sevilla, Spain
• Piero Fraternali, Politecnico di Milano, Italy
• In-Young Ko, KAIST Korea
• Qing Li, City University of Hong Kong, China
• Ee-Peng Lim, Singapore Management University, Singapore
• Cesare Pautasso, University of Lugano, Switzerland
• Gustavo Rossi, University of Nacional La Plata, Argentina
• Eva-Maria Schön, University of Applied Sciences Hamburg, Germany
• Andrés Jiménez Ramírez, University of Sevilla, Spain
• Jan Martijn van der Werf, Utrecht University, the Netherlands