Editorial Board Members

Associate Editors:

• Ioannis Anagnostopoulos, University of Thessaly, Greece
• Myriam Arrue, University of the Basque Country, Spain
• Max Bakaev, Novosibirsk State Technical University, Russia
• Jamie Blustein, Dalhousie University, Canada
• Alessandro Bozzon, Delft University of Technology, The Netherlands
• Richard Chbeir, Universite de Pau et des Pays de l'Adou, France
• Dickson Chiu, The University of Hong Kong, Hong Kong, China
• Oscar Corcho, Universidad Politécnica de Madrid, Spain
• Damiano Distante, University of Rome UnitelmaSapienza, Italy
• Jose Gonzalez Enriquez, University of Sevilla, Spain
• Maria Jose Escalona, Universidad de Sevilla, Spain
• Hao Han, Konica Minolta and The University of Tokyo, Japan
• Radu Ionescu, University of Bucharest, Romania
• Ashwin Ittoo, University of Liege, Belgium
• Epaminondas Kapetanios, University of Hertfordshire, UK
• Ralf Klamma, RWTH Aachen University, Germany
• Alexander Knapp, University of Augsburg, Germany
• In-Young Ko, KAIST Korea
• Lourdes Moreno Lopez, Universidad Carlos III de Madrid, Spain
• Zakaria Maamar, Zayed University, UAE
• Santiago Meliá, Universidad de Alicante, Spain.
• Tommi Mikkonen, University Jyväskylä, Finland
• Cesare Pautasso, University of Lugano, Switzerland
• Juan Manuel Murillo Rodríguez - University of Extremadura, Spain
• Andrés Jiménez Ramírez, University of Sevilla, Spain
• Wieland Schwinger, Johannes Kepler University, Austria
• Steve Simske, Colorado State University, USA
• Abhishek Srivastava, Indian Institute of Technology Indore, India
• Kostas Stefanidis, Tampere University, Finland
• Zhongjie Wang, Harbin Institute of Technology, China
• Jan Martijn van der Werf, Utrecht University, the Netherlands
• Marco Winckler, Université Côte d'Azur, France
• Yeliz Yesilada, Middle East Technical University, Turkey
• Gefei Zhang - HTW Berlin, Germany