Boundary Element Computation of Line Parameters of On-chip Interconnects on Lossy Silicon Substrate

Authors

  • Dongwei Li Dipartimento di Elettrotecnica Politecnico di Milano, Milano, 20133, Italy
  • Luca Di Rienzo Dipartimento di Elettrotecnica Politecnico di Milano, Milano, 20133, Italy

Keywords:

Boundary Element Computation of Line Parameters of On-chip Interconnects on Lossy Silicon Substrate

Abstract

A BEM formulation is applied to the extraction of series parameters of interconnects on lossy silicon substrate. The numerical formulation can take into account both a semi-infinite homogeneous conductive substrate and a homogeneous conductive substrate of finite thickness with backside metallization and needs the discretization of only the contours of the traces.

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Published

2022-05-02

How to Cite

[1]
D. . Li and L. D. . Rienzo, “Boundary Element Computation of Line Parameters of On-chip Interconnects on Lossy Silicon Substrate”, ACES Journal, vol. 26, no. 9, pp. 716–722, May 2022.

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