On-Wafer Measurement and Modeling of Silicon Carbide MESFET’s

Authors

  • L. Jordan Department of Electrical Engineering University of Mississippi, University, MS 38677-1848, USA
  • D. Elsherbeni Department of Electrical Engineering University of Mississippi, University, MS 38677-1848, USA
  • E. Hutchcraft Department of Electrical Engineering University of Mississippi, University, MS 38677-1848, USA
  • R. K. Gordon Department of Electrical Engineering University of Mississippi, University, MS 38677-1848, USA
  • D. Kajfez Department of Electrical Engineering University of Mississippi, University, MS 38677-1848, USA

Keywords:

On-Wafer Measurement and Modeling of Silicon Carbide MESFET’s

Abstract

The goal of this work was to characterize Silicon Carbide (SiC) transistor devices, with measurements and modeling using an advanced software package. To characterize and model the SiC Metal- Semiconductor Field-Effect Transistors (MESFETs), onwafer measurements of the transistors were performed and their behavior was characterized. The transistors were measured using a vector network analyzer in conjunction with a probing station to make contact with the individual devices on the wafers. Once measurements were complete and typical performance characteristics found, equivalent circuit models were designed and the components optimized to create equivalent circuits with matching characteristics.

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Published

2022-06-17

How to Cite

[1]
L. . Jordan, D. . Elsherbeni, E. . Hutchcraft, R. K. . Gordon, and D. . Kajfez, “On-Wafer Measurement and Modeling of Silicon Carbide MESFET’s”, ACES Journal, vol. 23, no. 1, pp. 76–83, Jun. 2022.

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General Submission